PSI - Issue 13

Felipe C. da Silva et al. / Procedia Structural Integrity 13 (2018) 658–663 / Structural Integrity Procedia 00 (2018) 000 – 000

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[8] – H. ELMKHAH, F. ATTARZADEH, A. FATTAH-ALHOSSEINI, K. H. KIM. Microstructural and electrochemical comparison between TiN coatings deposited through HIPIMS and DCMS techniques. Journal of Alloys and Compounds 735 (2018) 422 – 429. [9] - R D ARNELL, J S COLLIGON, K F MINNEBAEV AND V E YURASOVA. The effect of nitrogen content on the structure and mechanical properties of TiN films produced by magnetron sputtering. Vaccum, volume 47 (1996) 425 – 431. [10] S. ZHANG, W. ZHU. TiN coating of tool steels: a review. Journal of Materials Processing and Technology 39 (1993) 165 – 177. [11]- L.C. FONTANA, J.L.R. MUZART. Triode magnetron sputtering TiN film deposition. Surface and Coatings Technology 114 (1999) 7 – 12 . [12]- D. BHADUR, A. GHOSH, S. GANGOPADHYAY, S. PAUL. Effect of target frequency, bias voltage and bias frequency on microstructure and mechanical properties of pulsed DC CFUBM sputtered TiN coating. Surface & Coatings Technology 204 (2010) 3684 – 3697. [13]- Q. KONGA, L. JI, H. LI, X. LIU, Y. WANGA, J. CHEN, H. ZHOU. Influence of substrate bias voltage on the microstructure and residual stress of CrN films deposited by medium frequency magnetron sputtering. Materials Science and Engineering B 176 (2011) 850 – 854. [14]- A.G. GÓMEZ, A.A.C. RECCO, N.B. LIMA, L.G. MARTINEZ, A.P. TSCHIPTSCHIN, R.M. SOUZA. Residual stresses in titanium nitride thin films obtained with step variation of substrate bias voltage during deposition. Surface & Coatings Technology 204 (2010) 3228 – 3233 [15]- X. LI, Q. BAI, J YANG, Y LI, L WANG, H WANG, S REN, S LIU, W. HUANG. Effect of N2-gas flow rates on the structures and properties of copper nitride films prepared by reactive DC magnetron sputtering. Vacuum 89 (2013) 78-81. [16]- Y. SHI, F. PAN, M.BAO, Z. YANG, L. WANG. Effect of N2 flow rate on structure and property of ZrNbAlNx multilayer films deposi ted by magnetron sputtering. Journal of Alloys and Compounds 559 (2013) 196-202. [17]- L. SHAN, Y. WANG, J. LI, J. CHEN. Effect of N2 flow rate on microstructure and mechanical properties of PVD CrNx coatings for tribological application in seawater. Surface and Coating Technology 242 (2014) 74-82. [18]- M NOSE, M ZHOU, E HONBO, M YOKOTA, S SAJI. Colorimetric properties of ZrN and TiN coatings prepared by DC reactive sputtering. Surface and Coating Technology 142-144 (2001) 211-217. [19]- L. LU, F. LUO, Z. HUANG, W. ZHOU, D. ZHU. Influence of the nitrogen flow rate on the infrared emissivity of TiNx films. Infrared Physics and Technology 88 (2018) 144 – 148. [20]- T. ZHOU, D. LIU, Y. ZHANG, T. OUYANG, J. SUO. Microstructure and hydrogen impermeability of titanium nitride thin films deposited by direct current reactive magnetron sputtering. Journal of Alloys and Compounds 688 (2016) 44 – 50. [21] B. D. CULLITY, S. R. STOCK. Elements of X-ray diffraction. Pearson. 3rd Edition, 2001. [22] – G. M. PHARR, W, C, OLIVER, F. R. BROZEN. On the generality of the relationship among contact stiffness, contact area, and elastic modulus during indentation. Journal of Materials Research 7 (1992) 613 – 617.

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